The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2015
Filed:
Feb. 23, 2011
Hiroyuki Ishii, Shioya-gun, JP;
Yuichi Gyoda, Utsunomiya, JP;
Koji Mikami, Nikko, JP;
Kouichirou Tsujita, Utsunomiya, JP;
Hiroyuki Ishii, Shioya-gun, JP;
Yuichi Gyoda, Utsunomiya, JP;
Koji Mikami, Nikko, JP;
Kouichirou Tsujita, Utsunomiya, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
A computer readable storage medium is provided, storing a computer-executable program for causing a computer to determine at least one of mask pattern and exposure condition of an exposure apparatus having an illumination optical system for illuminating a mask with light from a light source and a projection optical system for projecting the mask pattern onto a substrate. The program causes the computer to perform calculation of an image of a pattern on an object plane of the projection optical system using information about lateral shift of an image caused by the exposure apparatus, and determination of at least one of the exposure condition and the mask pattern based on a calculation result.