The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2015

Filed:

Nov. 21, 2013
Applicants:

Tatsuya Miyadera, Kanagawa, JP;

Masayuki Hayashi, Osaka, JP;

Motohiro Kawanabe, Osaka, JP;

Yoshinori Shirasaki, Osaka, JP;

Masatoshi Murakami, Osaka, JP;

Inventors:

Tatsuya Miyadera, Kanagawa, JP;

Masayuki Hayashi, Osaka, JP;

Motohiro Kawanabe, Osaka, JP;

Yoshinori Shirasaki, Osaka, JP;

Masatoshi Murakami, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 15/00 (2006.01); H04N 1/00 (2006.01); H04N 1/028 (2006.01); G03G 15/01 (2006.01); G03G 15/00 (2006.01);
U.S. Cl.
CPC ...
H04N 1/00246 (2013.01); H04N 1/02815 (2013.01); G03G 15/0189 (2013.01); G03G 15/5058 (2013.01); G03G 2215/0161 (2013.01);
Abstract

An optical-writing control device calculates correction values for use in correcting a transfer position at which developing-agent images are to be transferred onto a sheet, and overlaying positions at which the developing-agent images are to be overlaid, based on a detection signal output from a sensor upon detection of a correction pattern for use in correcting the transfer position and a correction pattern for use in correcting the overlaying positions. A timing of detecting the pattern for use in correcting the overlaying positions is determined based on a correction value calculated based on the detection signal output upon detection of the pattern for use in correcting the transfer position. The pattern for use in correcting the transfer position is caused to have a width, in the main-scanning direction, that is wider than the width in the main-scanning direction of the pattern for use in correcting the overlaying positions.


Find Patent Forward Citations

Loading…