The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2015

Filed:

May. 07, 2012
Applicant:

Noritoshi Sakamoto, Shimotsuga-gun, JP;

Inventor:

Noritoshi Sakamoto, Shimotsuga-gun, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03B 27/54 (2006.01); G03F 9/00 (2006.01);
U.S. Cl.
CPC ...
G03F 9/7096 (2013.01); G03F 9/7069 (2013.01);
Abstract

The present invention provides an exposure apparatus including a measurement unit configured to measure a position of the mark on a substrate, and a control unit configured to control an amount of light on a predetermined plane of an optical system included in the measurement unit, wherein an amount of light emitted by a light source is smaller in a non-measurement period in which the position of the mark is not measured than in a measurement period in which the position of the mark is measured, and the control unit sets a transmittance in an optical path between the light source and the predetermined plane to be higher in the non-measurement period than in the measurement period.


Find Patent Forward Citations

Sakamoto, Noritoshi. (2015). Exposure apparatus and device fabrication method (U.S. Patent No. 9036131). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9036131

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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