The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2015

Filed:

Nov. 30, 2012
Applicants:

Gin-chung Wang, Grayslake, IL (US);

Jerry Wang, Lake Zurich, IL (US);

Huini Du, Vernon Hills, IL (US);

Inventors:

Gin-Chung Wang, Grayslake, IL (US);

Jerry Wang, Lake Zurich, IL (US);

Huini Du, Vernon Hills, IL (US);

Assignees:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G01T 1/20 (2006.01);
U.S. Cl.
CPC ...
G01T 1/2002 (2013.01);
Abstract

Systems, devices, processes, and algorithms for adapting and/or adjusting a reflectivity of a reflector in a radiation detector. The reflectivity can be changed by a reflectivity control signal that is generated based on an estimated count rate of events so as to adjust a probability of a photosensor detecting light resulting from the event via, for example, a scintillation event. By adjusting the probability, an energy resolution of the radiation detector can be optimized. The reflectivity of a reflector can be changed by changing a state of a thin film, a liquid crystal layer, or a suspended magnetic particle layer.


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