The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2015
Filed:
Apr. 21, 2010
Applicant:
Aloke K. Dutta, Troy, MI (US);
Inventor:
Aloke K. Dutta, Troy, MI (US);
Assignee:
Wayne State University, Detroit, MI (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C07D 215/26 (2006.01); C07D 215/20 (2006.01); C07D 215/22 (2006.01); C07D 215/227 (2006.01); C07D 215/233 (2006.01); C07D 417/12 (2006.01); A61K 31/50 (2006.01); C07D 209/08 (2006.01); C07D 215/38 (2006.01); C07D 215/46 (2006.01); C07D 215/54 (2006.01); C07D 231/56 (2006.01); C07D 277/82 (2006.01); C07D 307/85 (2006.01); C07D 333/70 (2006.01);
U.S. Cl.
CPC ...
A61K 31/50 (2013.01); C07D 209/08 (2013.01); C07D 215/26 (2013.01); C07D 215/38 (2013.01); C07D 215/46 (2013.01); C07D 215/54 (2013.01); C07D 231/56 (2013.01); C07D 277/82 (2013.01); C07D 307/85 (2013.01); C07D 333/70 (2013.01); C07D 417/12 (2013.01);
Abstract
A precursor for the deposition of a thin film by atomic layer deposition is provided. The compound has the formula MLwhere M is a metal and L is an amidrazone-derived ligand or an amidate-derived ligand. A process of forming a thin film using the precursors is also provided.