The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2015

Filed:

Aug. 20, 2013
Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Karthik Balakrishnan, New York, NY (US);

Josephine B. Chang, Mahopac, NY (US);

Paul Chang, Mahopac, NY (US);

Michael A. Guillorn, Yorktown Heights, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/8238 (2006.01); H01L 29/06 (2006.01); H01L 21/84 (2006.01); H01L 29/423 (2006.01); H01L 27/11 (2006.01); H01L 27/12 (2006.01); H01L 21/70 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0673 (2013.01); H01L 21/84 (2013.01); H01L 29/42392 (2013.01); H01L 27/1108 (2013.01); H01L 27/1203 (2013.01);
Abstract

A memory device includes a first plurality of semiconductor nanowires tethered between landing pads and suspended over a substrate. A first gate electrode surrounds each of the first plurality of semiconductor nanowires, making them gate-all-around (GAA) semiconductor nanowires. First, second, and third field effect transistors (FETs) are formed by the first plurality of semiconductor nanowires. The memory device also includes a second plurality of semiconductor nanowires tethered between landing pads and suspended over the substrate. A second gate electrode surrounds each of the second plurality of semiconductor nanowires, making them GAA semiconductor nanowires. Fourth, fifth, and sixth FETs are formed by the second plurality of semiconductor nanowires. The first gate electrode is aligned with and cross-coupled to a landing pad of the second plurality of semiconductor nanowires, and the second gate electrode is aligned with and cross-coupled to a landing pad of the first plurality of semiconductor nanowires.


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