The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 19, 2015
Filed:
Jul. 28, 2011
Applicants:
Masamitsu Itoh, Yokohama, JP;
Katsuya Okumura, Tokyo, JP;
Taro Inada, Shibukawa, JP;
Jun Watanabe, Shibukawa, JP;
Inventors:
Masamitsu Itoh, Yokohama, JP;
Katsuya Okumura, Tokyo, JP;
Taro Inada, Shibukawa, JP;
Jun Watanabe, Shibukawa, JP;
Assignee:
KABUSHIKI KAISHA TOSHIBA, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
B32B 7/12 (2006.01); B08B 7/00 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
B08B 7/0028 (2013.01); G03F 7/707 (2013.01); G03F 7/70925 (2013.01);
Abstract
According to one embodiment, a reticle chuck cleaner for cleaning a reticle chuck of an EUV exposure apparatus includes a substrate having a shape to be carried to the reticle chuck of the EUV exposure apparatus, and an adhesive formed on one of the main surfaces of the substrate.