The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 19, 2015

Filed:

Jun. 10, 2011
Applicants:

Mikiko Saito, Wako, JP;

Takashi Notake, Wako, JP;

Hiroaki Minamide, Wako, JP;

Hiromasa Ito, Wako, JP;

Inventors:

Mikiko Saito, Wako, JP;

Takashi Notake, Wako, JP;

Hiroaki Minamide, Wako, JP;

Hiromasa Ito, Wako, JP;

Assignee:

RIKEN, Wako, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C30B 29/54 (2006.01); C07C 205/06 (2006.01); C30B 7/08 (2006.01); C30B 7/00 (2006.01); C07C 211/52 (2006.01); G02F 1/355 (2006.01);
U.S. Cl.
CPC ...
C30B 7/08 (2013.01); C30B 7/00 (2013.01); C30B 7/005 (2013.01); C07B 2200/13 (2013.01); C07C 211/52 (2013.01); C30B 29/54 (2013.01); G02F 1/3551 (2013.01);
Abstract

An object of the present invention is to produce a non-conventional high-quality BNA single crystal. Another object of the present invention is to provide a process for producing the above-described high-quality BNA single crystal. Specifically, the present invention provides a BNA crystal characterized by having a half-value width of diffraction peak X-ray intensity of 100 seconds or less in a rocking curve measurement by X-ray diffraction method.


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