The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2015
Filed:
Mar. 28, 2011
Applicants:
Takashi Wakui, Kanagawa, JP;
Hideyasu Ishibashi, Kanagawa, JP;
Osamu Shimazaki, Kanagawa, JP;
Inventors:
Assignee:
FUJIFILM Corporation, Tokyo, JP;
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
G06K 9/00 (2006.01); H05K 9/00 (2006.01);
U.S. Cl.
CPC ...
H05K 9/0086 (2013.01);
Abstract
Disclosed is a method for manufacturing a conductive film in which a mesh pattern comprising a wire material is provided on a base material. Also disclosed are a conductive film and a recording medium. Image data representing a mesh pattern is created on the basis of a plurality of selected positions. On the basis of said image data, an evaluation value which quantifies noise characteristics of the mesh pattern is computed. On the basis of the computed evaluation value and prescribed evaluation conditions, one image datum is chosen as an output image datum.