The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2015

Filed:

Oct. 02, 2012
Applicant:

Canon Kabushiki Kaisha, Tokyo, JP;

Inventors:

Tsuyoshi Kitamura, Utsunomiya, JP;

Takashi Sukegawa, Utsunomiya, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01S 3/22 (2006.01); G02B 5/18 (2006.01); H01S 3/08 (2006.01); H01S 3/225 (2006.01);
U.S. Cl.
CPC ...
G02B 5/1861 (2013.01); H01S 3/08004 (2013.01); H01S 3/225 (2013.01);
Abstract

A manufacturing method for an excimer laser that includes a reflective Echelle diffraction grating includes obtaining information of a wavelength of a light source, a blazed order, a repetitive pitch of the grating, a material of the grating, and a predefined orientation ratio B/A that is a ratio between that a diffraction efficiency A of the blazed order and a diffraction efficiency Bb of an order lower by one order than the blazed order, and determining an initial value of a blaze angle based upon these pieces of information.


Find Patent Forward Citations

Kitamura, Tsuyoshi. (2015). Echelle diffraction grating and its manufacturing method, excimer laser and its manufacturing method (U.S. Patent No. 9031112). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9031112

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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