The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2015
Filed:
Nov. 11, 2013
Canon Kabushiki Kaisha, Tokyo, JP;
Senichi Saito, Funabashi, JP;
Akitoshi Yamada, Yokohama, JP;
Tomokazu Ishikawa, Yokohama, JP;
Fumitaka Goto, Tokyo, JP;
Nobutaka Miyake, Yokohama, JP;
Mitsuhiro Ono, Tokyo, JP;
Ryosuke Iguchi, Kawasaki, JP;
Hidetsugu Kagawa, Kawasaki, JP;
Junichi Nakagawa, Tokyo, JP;
Canon Kabushiki Kaisha, Tokyo, JP;
Abstract
Nozzles in a print head are arrayed in a density of 600 dpi. Moreover, a dither matrix has a size of 16 pixels×16 pixels in 600 dpi. The dither matrix is repeatedly used. In the meantime, each of rectangles represents an HS processing unit. WHS=3 pixels. As a consequence, the relationship of a least common multiple below is established in a nozzle array direction: 3×WD=16×WHS. In this case, the cycle of interference unevenness can be prolonged to the least common multiple between WD and WHS, that is, 48 pixels (3WD). In this manner, the size of the dither matrix is not an integral multiple of the HS processing unit width, so that the cycle of interference unevenness can be prolonged more than the size of the dither matrix. Thus, the interference unevenness can be hardly recognized.