The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2015

Filed:

Nov. 29, 2011
Applicants:

Atsuhito Murai, Osaka, JP;

Yukinobu Nakata, Osaka, JP;

Shingo Kawashima, Osaka, JP;

Jun Nishimura, Osaka, JP;

Inventors:

Atsuhito Murai, Osaka, JP;

Yukinobu Nakata, Osaka, JP;

Shingo Kawashima, Osaka, JP;

Jun Nishimura, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G02F 1/1362 (2006.01); G02F 1/1335 (2006.01); H01L 29/786 (2006.01); H01L 27/12 (2006.01); H01L 29/66 (2006.01); G02F 1/1337 (2006.01); G02F 1/1333 (2006.01); H01L 27/32 (2006.01);
U.S. Cl.
CPC ...
G02F 1/136209 (2013.01); G02F 2001/136222 (2013.01); G02F 1/133512 (2013.01); G02F 1/133707 (2013.01); H01L 27/1225 (2013.01); H01L 29/78633 (2013.01); H01L 29/7869 (2013.01); H01L 29/78693 (2013.01); H01L 29/66969 (2013.01); G02F 2201/40 (2013.01); G02F 1/133345 (2013.01); H01L 27/3272 (2013.01);
Abstract

A semiconductor device (A) according to the present invention includes: a thin-film transistor (); a first insulating layer () which has been formed over the thin-film transistor (); a second insulating layer () which has been formed on the first insulating layer () and which has a hole (); and an opaque layer () which is arranged so as to overlap an oxide semiconductor layer () when viewed along a normal to the substrate (). The opaque layer () has been formed in the hole (). The opaque layer () has a raised and curved upper surface and the upper surface of the second insulating layer () is located closer to the substrate () than the upper surface of the opaque layer () is.


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