The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2015
Filed:
Nov. 17, 2009
E. Szilveszter Vizi, Budapest, HU;
Gergely Katona, Budapest, HU;
J. Balazs Rozsa, Budapest, HU;
Attila Kaszas, Szeged, HU;
Gergely Turi, Budapest, HU;
E. Szilveszter Vizi, Budapest, HU;
Gergely Katona, Budapest, HU;
J. Balazs Rozsa, Budapest, HU;
Attila Kaszas, Szeged, HU;
Gergely Turi, Budapest, HU;
Femtonics Kft., Budapest, HU;
Abstract
The invention relates to a method for carrying out measurements on at least one region of interest within a sample via a laser scanning microscope having focusing means for focusing a laser beam and having electro-mechano-optic deflector for deflecting the laser beam, the method comprising: providing a scanning trajectory for the at least one region of interest; providing a sequence of measurements and the corresponding scanning trajectories; providing cross-over trajectories between the scanning trajectories of two consecutive measurements; deflecting the laser beam via the electro-mechano-optic means for moving a focus spot of the focused laser beam along a scanning trajectory at an average scanning speed; and deflecting the laser beam via the electro-mechano-optic means for moving the focus spot of the laser beam along a cross-over trajectory at a cross-over speed having a maximum, the maximum of the cross-over speed being higher than the average scanning speed. The invention further relates to a measuring system for implementing the method according to the invention
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile