The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2015

Filed:

Oct. 05, 2012
Applicant:

Electronics and Telecommunications Research Institute, Daejeon, KR;

Inventor:

Dong-Uk Sim, Daejeon, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 15/02 (2006.01); H01Q 1/24 (2006.01); H01Q 17/00 (2006.01);
U.S. Cl.
CPC ...
H01Q 1/243 (2013.01); H01Q 17/00 (2013.01);
Abstract

A method of manufacturing a transparent film for reducing electromagnetic waves includes forming a first dielectric layer and forming a pattern layer on the first dielectric layer. The pattern layer is made of a transparent electrode material having surface resistance.


Find Patent Forward Citations

Sim, Dong-Uk. (2015). Transparent film for reducing electromagnetic waves and method of manufacturing the same (U.S. Patent No. 9030373). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9030373

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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