The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2015

Filed:

Apr. 03, 2013
Applicant:

Samsung Electronics Co., Ltd., Suwon-Si, Gyeonggi-Do, KR;

Inventors:

Chang-seung Lee, Yongin-si, KR;

Yong-sung Kim, Namyangju-si, KR;

Jeo-young Shim, Yongin-si, KR;

Joo-ho Lee, Hwaseong-si, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G01N 27/00 (2006.01); G01R 27/08 (2006.01); G01N 33/487 (2006.01); B82Y 15/00 (2011.01); G01N 15/12 (2006.01); G01N 27/327 (2006.01);
U.S. Cl.
CPC ...
B82Y 15/00 (2013.01); Y10S 977/734 (2013.01); Y10S 977/938 (2013.01); G01N 15/1227 (2013.01); G01N 27/3271 (2013.01); G01N 33/48721 (2013.01);
Abstract

A nanogap device includes a first insulation layer having a nanopore formed therein, a first nanogap electrode which may be formed on the first insulation layer and may be divided into two parts with a nanogap interposed between the two parts, the nanogap facing the nanopore, a second insulation layer formed on the first nanogap electrode, a first graphene layer formed on the second insulation layer, a first semiconductor layer formed on the first graphene layer, a first drain electrode formed on the first semiconductor layer, and a first source electrode formed on the first graphene layer such as to be apart from the first semiconductor layer.


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