The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2015

Filed:

Jun. 05, 2013
Applicant:

Lapis Semiconductor Co., Ltd., Yokohama, JP;

Inventors:

Takao Kaji, Miyazaki, JP;

Katsuhito Sasaki, Miyazaki, JP;

Takaaki Kodaira, Miyazaki, JP;

Yuuki Doi, Miyazaki, JP;

Minako Oritsu, Miyazaki, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/70 (2006.01); H01L 29/02 (2006.01); H01L 29/76 (2006.01); H01L 29/00 (2006.01); H01L 29/06 (2006.01); H01L 21/762 (2006.01); H01L 29/732 (2006.01); H01L 29/78 (2006.01);
U.S. Cl.
CPC ...
H01L 29/0649 (2013.01); H01L 21/76224 (2013.01); H01L 29/732 (2013.01); H01L 29/78 (2013.01); H01L 29/0619 (2013.01);
Abstract

A semiconductor device includes a semiconductor substrate, an element isolating trench structure that includes an element isolating trench formed in one main surface of the semiconductor substrate, an insulating material that is formed within the element isolating trench, element formation regions that are surrounded by the element isolating trench, and semiconductor elements that are respectively formed in the element formation regions. The element isolating trench includes first element isolating trenches extending in a first direction, second element isolating trenches extending in a second direction that are at a right angle to the first direction, and third element isolating trenches extending in a third direction inclined at an angle θ (0°<θ<90°) from the first direction.


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