The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2015

Filed:

Sep. 16, 2011
Applicants:

Yoshiyuki Kawashima, Kanagawa, JP;

Koichi Toba, Kanagawa, JP;

Inventors:

Yoshiyuki Kawashima, Kanagawa, JP;

Koichi Toba, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/788 (2006.01); H01L 29/66 (2006.01); H01L 27/115 (2006.01); H01L 29/792 (2006.01); H01L 29/423 (2006.01);
U.S. Cl.
CPC ...
H01L 29/792 (2013.01); H01L 29/66833 (2013.01); H01L 27/11573 (2013.01); H01L 29/42344 (2013.01);
Abstract

An improvement is achieved in the performance of semiconductor device including a nonvolatile memory. In a split-gate nonvolatile memory, between a memory gate electrode and a p-type well and between a control gate electrode and the memory gate electrode, an insulating film is formed. Of the insulating film, the portion between the lower surface of the memory gate electrode and the upper surface of a semiconductor substrate has silicon oxide films, and a silicon nitride film interposed between the silicon oxide films. Of the insulating film, the portion between a side surface of the control gate electrode and a side surface of the memory gate electrode is formed of a silicon oxide film, and does not have the silicon nitride film.


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Kawashima, Yoshiyuki. (2015). Semiconductor device and manufacturing method thereof (U.S. Patent No. 9029931). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9029931

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