The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2015

Filed:

Jun. 24, 2014
Applicants:

Nizar Haddad, Danbury, CT (US);

Heewon Lee, Parsippany, NJ (US);

BO Qu, Brookfield, CT (US);

Sonia Rodriguez, New Milford, CT (US);

Chris Hugh Senanayake, Brookfield, CT (US);

Inventors:

Nizar Haddad, Danbury, CT (US);

Heewon Lee, Parsippany, NJ (US);

Bo Qu, Brookfield, CT (US);

Sonia Rodriguez, New Milford, CT (US);

Chris Hugh Senanayake, Brookfield, CT (US);

Assignee:

Boehringer Ingelheim International GmbH, Ingelheim am Rhein, DE;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C07F 15/00 (2006.01); C07D 405/04 (2006.01); B01J 31/22 (2006.01); C07D 215/20 (2006.01); C07D 209/04 (2006.01); C07D 333/54 (2006.01); C07D 307/79 (2006.01); C07C 29/145 (2006.01); C07D 231/56 (2006.01); B01J 23/46 (2006.01); B01J 31/24 (2006.01); C07C 29/156 (2006.01); C07B 53/00 (2006.01);
U.S. Cl.
CPC ...
B01J 31/2295 (2013.01); C07D 215/20 (2013.01); C07D 209/04 (2013.01); C07D 333/54 (2013.01); C07D 307/79 (2013.01); C07C 29/145 (2013.01); C07D 231/56 (2013.01); B01J 23/462 (2013.01); B01J 31/24 (2013.01); C07C 29/156 (2013.01); C07B 53/00 (2013.01); C07F 15/0046 (2013.01); C07F 15/0053 (2013.01);
Abstract

Disclosed are novel ruthenium compounds of formula (Ia) and (Ib): wherein Rand the moietyare defined herein. Also disclosed is a process for using these novel ruthenium compounds as catalysts for asymmetric hydrogenation and transfer hydrogenation of ketones with high reactivities and excellent selectivities.


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