The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 12, 2015

Filed:

Sep. 03, 2013
Applicant:

Kabushiki Kaisha Toshiba, Tokyo, JP;

Inventor:

Kyoichi Suguro, Kanagawa, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/20 (2006.01); H01L 21/36 (2006.01); H01L 21/02 (2006.01); H01L 21/67 (2006.01); H01L 21/324 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02592 (2013.01); H01L 21/67011 (2013.01); H01L 21/02532 (2013.01); H01L 21/0262 (2013.01); H01L 21/02667 (2013.01); H01L 21/02672 (2013.01); H01L 21/324 (2013.01);
Abstract

According to one embodiment, a manufacturing method of a semiconductor device includes forming a crystal film on a semiconductor substrate by irradiating the semiconductor substrate with a first microwave, obtained by providing frequency modulation or phase modulation of a first carrier wave which is a sine wave with a first frequency, using a first signal wave which is a sine wave or a pulse wave with a third frequency lower than a first frequency, and irradiating the semiconductor substrate with a second microwave, obtained by providing frequency modulation or phase modulation of a second carrier wave, which is a sine wave with a second frequency higher than the first frequency, using a second signal wave which is a sine wave or a pulse wave with a fourth frequency lower than the second frequency.


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