The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2015
Filed:
Jun. 08, 2006
Applicants:
Katsuo Komiya, Hikari, JP;
Yuji Kubo, Shunan, JP;
Sanae Hasegawa, Suzuka, JP;
Inventors:
Assignee:
Tosoh Corporation, Shunan-shi, JP;
Primary Examiner:
Int. Cl.
CPC ...
B01J 41/14 (2006.01); C08F 220/26 (2006.01); B01J 39/20 (2006.01); C08F 220/60 (2006.01); B01J 41/20 (2006.01); B01J 39/26 (2006.01); C08F 220/32 (2006.01); C08G 81/02 (2006.01); C08F 222/10 (2006.01);
U.S. Cl.
CPC ...
B01J 41/14 (2013.01); C08F 2800/20 (2013.01); C08F 220/26 (2013.01); C08F 222/1006 (2013.01); B01J 39/20 (2013.01); C08F 220/60 (2013.01); C08F 2810/20 (2013.01); B01J 41/20 (2013.01); B01J 39/26 (2013.01); C08F 220/32 (2013.01); C08G 81/02 (2013.01);
Abstract
To provide a medium suitable for high speed/high resolution, rich in hydrophilicity and resistant to a high concentration aqueous alkaline solution. A medium comprising crosslinked polymer particles containing from 20 to 95 mol % of repeating units derived from a (meth)acryloyl monomer represented by the formula (1): wherein Ris a hydrogen atom or a Calkyl group, Ris —NR-R-Ror —O—R-R, Ris a hydrogen atom or a Calkyl group, Ris a Calkylene group containing an alicyclic ring or a Clinear alkylene group, and Ris a halogen atom, an alcoholic OH group, an amino group, a glycidyl group or an epoxy group.