The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2015
Filed:
Mar. 10, 2011
Won-jae Moon, Seoul, KR;
Hyung-young OH, Goyang-si, KR;
Dae-yeon Lee, Chungbuk, KR;
Jae-ik Song, Cheongju-si, KR;
Young-kuk Kim, Paju-si, KR;
Kyu-chul Chung, Chungbuk, KR;
Hyun-chul Chung, Cheongju-si, KR;
Won-Jae Moon, Seoul, KR;
Hyung-Young Oh, Goyang-si, KR;
Dae-Yeon Lee, Chungbuk, KR;
Jae-Ik Song, Cheongju-si, KR;
Young-Kuk Kim, Paju-si, KR;
Kyu-Chul Chung, Chungbuk, KR;
Hyun-Chul Chung, Cheongju-si, KR;
LG Chem, Ltd., Seoul, KR;
Abstract
Disclosed are an apparatus and a method for monitoring a glass plate polishing state. The apparatus may include a location measuring unit for measuring a location on a glass plate being polished by a polishing machine, a current measuring unit for measuring an electric current flowing into the polishing machine, a memory unit for storing a reference value of the electric current flowing into the polishing machine for each polishing location of the glass plate, and a control unit for determining whether a polishing state is faulty, by comparing a value of the electric current measured by the current measuring unit for each polishing location measured by the location measuring unit with a corresponding reference value of the electric current stored in the memory unit for each polishing location.