The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 12, 2015
Filed:
Mar. 15, 2013
Yong-jhin Cho, Hwaseong-si, KR;
Yongsun Ko, Suwon-si, KR;
Kyoungseob Kim, Suwon-si, KR;
Kwangsu Kim, Seoul, KR;
Seokhoon Kim, Seongnam-si, KR;
Jung-min OH, Incheon, KR;
Kuntack Lee, Suwon-si, KR;
Wonho Jang, Yongin-si, KR;
Yongmyung Jun, Hwaseong-si, KR;
Yong-Jhin Cho, Hwaseong-si, KR;
Yongsun Ko, Suwon-si, KR;
Kyoungseob Kim, Suwon-si, KR;
Kwangsu Kim, Seoul, KR;
SeokHoon Kim, Seongnam-si, KR;
Jung-Min Oh, Incheon, KR;
Kuntack Lee, Suwon-si, KR;
Wonho Jang, Yongin-si, KR;
Yongmyung Jun, Hwaseong-si, KR;
Abstract
Substrate treatment systems are provided. The substrate treatment systems may include a treating device configured to treat a substrate with a supercritical fluid, and a supplying device configured to supply the supercritical fluid to the treating device. The treating device may include a supercritical process zone in which the substrate is treated with the supercritical fluid, and a pre-supercritical process zone in which the supercritical fluid is expanded and then provided into the supercritical process zone to create a supercritical state in the supercritical process zone.