The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2015

Filed:

Oct. 26, 2010
Applicants:

Julien Doublet, Paris, FR;

Michaël Verilhac, Paris, FR;

Stephane Revelin, Paris, FR;

Sylvaine Picard, Paris, FR;

Inventors:

Julien Doublet, Paris, FR;

Michaël Verilhac, Paris, FR;

Stephane Revelin, Paris, FR;

Sylvaine Picard, Paris, FR;

Assignee:

Morpho, Paris, FR;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
G06K 9/40 (2006.01); G06T 5/00 (2006.01); G06T 3/00 (2006.01); G06T 15/10 (2011.01);
U.S. Cl.
CPC ...
G06T 5/002 (2013.01); G06T 3/0031 (2013.01); G06T 15/10 (2013.01);
Abstract

The present invention relates to a method and device for obtaining an image of a crumpled document from an image of this document when it is crumpled. The method comprises a step of determining a three-dimensional geometric model of the surface of the crumpled document by triangulation of three-dimensional points defined from the pattern of a target extracted from the image of this document when it is crumpled; the method is characterized in that it comprises a step of determining a projection of the three-dimensional geometric model onto a so-called acquisition plane, by means of error minimization of this projection under constraints of preserving defined geometric characteristics in the vicinity of the three-dimensional points, and in that it comprises a step of superimposing the textures associated with the three-dimensional model onto the projection of this model thus determined. The present invention likewise relates to target patterns that make it possible to improve the quality of the image resulting from the method to be improved and/or to reduce the cost for computing said image.


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