The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2015
Filed:
Jul. 15, 2014
General Electric Company, Schenectady, NY (US);
Xiaoye Wu, Rexford, NY (US);
Jiang Hsieh, Brookfield, WI (US);
Paavana Sainath, Oconomowoc, WI (US);
Dan Xu, Aurora, IL (US);
Yannan Jin, Schenectady, NY (US);
Girijesh Kumar Yadava, Waukesha, WI (US);
Adam Israel Cohen, Milwaukee, WI (US);
Hewei Gao, Schenectady, NY (US);
General Electric Company, Niskayuna, NY (US);
Abstract
A method is provided. The method includes acquiring projection data of an object from a plurality of pixels, reconstructing the acquired projection data from the plurality of pixels into a reconstructed image, performing material characterization and decomposition of an image volume of the reconstructed image to reduce a number of materials analyzed in the image volume to two basis materials. The method also includes generating a re-mapped image volume for at least one basis material of the two basis materials, and performing forward projection on at least the re-mapped image volume for the at least one basis material to produce a material-based projection. The method further includes generating multi-material corrected projections based on the material-based projection and a total projection attenuated by the object, which represents both of the two basis materials, wherein the multi-material corrected projections include linearized projections.