The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2015

Filed:

Mar. 11, 2013
Applicant:

The Regents of the University of California, Oakland, CA (US);

Inventors:

Deli Wang, San Diego, CA (US);

Cesare Soci, La Jolla, CA (US);

Yu-Hwa Lo, San Diego, CA (US);

Arthur Zhang, San Diego, CA (US);

David Aplin, Cambridgeshire, GB;

Lingquan Wang, Santa Clara, CA (US);

Shadi Dayeh, Los Alamos, NM (US);

Xin Yu Bao, Mountain View, CA (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 31/00 (2006.01); H01L 31/0352 (2006.01); B82Y 20/00 (2011.01); H01L 27/146 (2006.01);
U.S. Cl.
CPC ...
H01L 31/035227 (2013.01); B82Y 20/00 (2013.01); H01L 27/14643 (2013.01); H01L 31/035236 (2013.01);
Abstract

A 1D nanowire photodetector device includes a nanowire that is individually contacted by electrodes for applying a longitudinal electric field which drives the photocurrent. An intrinsic radial electric field to inhibits photo-carrier recombination, thus enhancing the photocurrent response. Circuits of 1D nanowire photodetectors include groups of photodetectors addressed by their individual 1D nanowire electrode contacts. Placement of 1D nanostructures is accomplished with registration onto a substrate. A substrate is patterned with a material, e.g., photoresist, and trenches are formed in the patterning material at predetermined locations for the placement of 1D nanostructures. The 1D nanostructures are aligned in a liquid suspension, and then transferred into the trenches from the liquid suspension. Removal of the patterning material places the 1D nanostructures in predetermined, registered positions on the substrate.


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