The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2015
Filed:
Nov. 18, 2010
Seiji Shinkai, Fukuoka, JP;
Shuichi Haraguchi, Machida, JP;
Tomohiro Shiraki, Champaign, IL (US);
Masashi Ogawa, Fukuoka, JP;
Shuhei Nakatani, Osaka, JP;
Kei Sakanoue, Fukuoka, JP;
Osamu Goto, Tsukuba, JP;
Hidenobu Kakimoto, Tsukuba, JP;
Seiji Shinkai, Fukuoka, JP;
Shuichi Haraguchi, Machida, JP;
Tomohiro Shiraki, Champaign, IL (US);
Masashi Ogawa, Fukuoka, JP;
Shuhei Nakatani, Osaka, JP;
Kei Sakanoue, Fukuoka, JP;
Osamu Goto, Tsukuba, JP;
Hidenobu Kakimoto, Tsukuba, JP;
Joled Inc., Tokyo, JP;
Sumitomo Chemical Company, Limited, Tokyo, JP;
Abstract
A problem of the present invention is to prevent a base layer beneath the layer to be irradiated with light from deterioration in property and a functional thin film from deterioration in property as the fine patterning of a functional film is performed with light irradiation. Means for solving the problem is a compound obtained by dimerizing with light irradiation a compound (A) containing a group that has photosensitivity and can be photodimerized and a group having lyophilicity and a compound (B) containing a group that has photosensitivity and can be photodimerized and a group having liquid-repellency.