The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2015

Filed:

Aug. 19, 2010
Applicants:

Junpei Yamanaka, Nagoya, JP;

Akiko Toyotama, Nagoya, JP;

Fumio Uchida, Osaka, JP;

Satoshi Kawanaka, Osaka, JP;

Inventors:

Junpei Yamanaka, Nagoya, JP;

Akiko Toyotama, Nagoya, JP;

Fumio Uchida, Osaka, JP;

Satoshi Kawanaka, Osaka, JP;

Assignee:

Fuji Chemical Company, Limited, Osaka-Shi, Osaka, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C08F 2/44 (2006.01); C08K 3/36 (2006.01); C08F 265/06 (2006.01); C08L 33/12 (2006.01); C08F 2/46 (2006.01); C08F 2/48 (2006.01);
U.S. Cl.
CPC ...
C08L 33/12 (2013.01);
Abstract

The present invention provides an acrylic resin composition containing a polycrystal of colloidal particles of silicon oxide in an acrylic resin that is formed by curing an acrylic monomer liquid at room temperature and/or an acrylic oligomer liquid at room temperature, wherein a mean distance between the colloidal particles in the polycrystal is 140 to 330 nm. The size of the single crystal that constitutes the polycrystal can be controlled by adjusting the content of silicon oxide and/or the additive amount of impurities. An architectural material, a fashion accessory, and an optical material are provided that are formed by using the acrylic resin composition.


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