The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2015
Filed:
Sep. 16, 2013
Applicant:
Chi Mei Corporation, Tainan, TW;
Inventors:
Kai-Min Chen, Tainan, TW;
Chun-An Shih, Tainan, TW;
Assignee:
Chi Mei Corporation, Tainan, TW;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/22 (2006.01); G03F 7/022 (2006.01); G03F 7/004 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0226 (2013.01); G03F 7/0045 (2013.01);
Abstract
A photosensitive resin composition includes: an alkali-soluble resin; an o-naphthoquinonediazidesulfonic acid ester; a urethane(meth)acrylate compound having at least six (meth)acryloyl groups in a molecule; and a solvent. A protective film which is formed from the photosensitive resin composition and an element which includes the protective film are also provided.
Quick Actions:
Chen, Kai-Min. (2015). Photosensitive resin composition and applications thereof (U.S. Patent No. 9023589). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9023589
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile