The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2015

Filed:

Nov. 23, 2011
Applicants:

Jong-hwa Lee, Uiwang-si, KR;

Hyun-yong Cho, Uiwang-si, KR;

Mi-ra Im, Uiwang-si, KR;

Hwan-sung Cheon, Uiwang-si, KR;

Min-kook Chung, Uiwang-si, KR;

Ji-young Jeong, Uiwang-si, KR;

Myoung-hwan Cha, Uiwang-si, KR;

Inventors:

Jong-Hwa Lee, Uiwang-si, KR;

Hyun-Yong Cho, Uiwang-si, KR;

Mi-Ra Im, Uiwang-si, KR;

Hwan-Sung Cheon, Uiwang-si, KR;

Min-Kook Chung, Uiwang-si, KR;

Ji-Young Jeong, Uiwang-si, KR;

Myoung-Hwan Cha, Uiwang-si, KR;

Assignee:

Cheil Industries Inc., Gumi-si, KR;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/023 (2006.01); H01L 23/29 (2006.01); G03F 7/075 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0233 (2013.01); H01L 23/293 (2013.01); G03F 7/0236 (2013.01); G03F 7/0751 (2013.01);
Abstract

Disclosed is a positive photosensitive resin composition that includes (A) an alkali soluble resin; (B) a novolac resin including a repeating unit represented by Chemical Formula 6; (C) a photosensitive diazoquinone compound; (D) a silane compound; and (E) a solvent, a photosensitive resin film prepared by using the positive photosensitive resin composition, and a semiconductor device including the photosensitive resin film.


Find Patent Forward Citations

Loading…