The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
May. 05, 2015

Filed:

Sep. 25, 2012
Applicants:

Yuichiro Takeshima, Toyama, JP;

Osamu Kasahara, Toyama, JP;

Kazuyuki Toyoda, Toyama, JP;

Junichi Tanabe, Toyama, JP;

Katsuhiko Yamamoto, Toyama, JP;

Hisashi Nomura, Toyama, JP;

Inventors:

Yuichiro Takeshima, Toyama, JP;

Osamu Kasahara, Toyama, JP;

Kazuyuki Toyoda, Toyama, JP;

Junichi Tanabe, Toyama, JP;

Katsuhiko Yamamoto, Toyama, JP;

Hisashi Nomura, Toyama, JP;

Assignee:
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/00 (2006.01); C23C 16/56 (2006.01); C23C 16/54 (2006.01); H01L 21/67 (2006.01); H01L 21/687 (2006.01); C23C 16/44 (2006.01); C23C 16/46 (2006.01); H01L 21/683 (2006.01); H01L 21/677 (2006.01);
U.S. Cl.
CPC ...
C23C 16/54 (2013.01); H01L 21/67109 (2013.01); H01L 21/67754 (2013.01); H01L 21/68764 (2013.01); H01L 21/68771 (2013.01); H01L 21/02164 (2013.01); H01L 21/02219 (2013.01); H01L 21/02274 (2013.01); H01L 21/0228 (2013.01); C23C 16/4408 (2013.01); C23C 16/463 (2013.01);
Abstract

A method of manufacturing a semiconductor device including: mounting a substrate on a substrate mounting member that is disposed in a reaction container; heating the substrate at a predetermined processing temperature and supplying a first gas and a second gas to the substrate to process the substrate; stopping supply of the first gas and the second gas, and supplying an inert gas into the reaction container; and unloading the substrate to outside the reaction container.


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