The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
May. 05, 2015
Filed:
Dec. 06, 2010
Takahiro Kozuka, Itoigawa, JP;
Takahiro Kozuka, Itoigawa, JP;
Denki Kagaku Kogyo Kabushiki Kaisha, Tokyo, JP;
Abstract
Provided are an apparatus for removing residual monomers and a method of producing a polyvinyl alcohol resin that can prevent drift of the organic solvent gas and residual of the polymerization solution on the trays and permits efficient removal of the unreacted monomers from the polymerization solution. An apparatusfor removing residual monomers having a column main body and valve trayshaving multiple gas blowout ports each having openings only in a direction perpendicular to the flow direction of the polymerization solutionor openings directed downward in the flow direction of the polymerization solution, which are installed in multiple stages in the column main body is used in a monomer-removing step of removing monomers in a polymerization solutionby bringing an organic solvent gas, such as methanol gas, into contact with a polymerization solutionobtained from a polymerization reactor
Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile