The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2015
Filed:
Jul. 06, 2010
Jian Sun, Richmond, CA;
Weiman Qian, Vancouver, CA;
Wei Qu, Vancouver, CA;
Shiqiang Hui, Vancouver, CA;
Jian Sun, Richmond, CA;
Weiman Qian, Vancouver, CA;
Wei Qu, Vancouver, CA;
Shiqiang Hui, Vancouver, CA;
National Research Council of Canada, Ottawa, ON, CA;
Abstract
The invention disclosed is a pulsed power supply for plasma electrolytic deposition (PED) for generating pulsed direct current for controlled interruption of the arcing process of PED, comprising a power distribution and relay logic (PDRL) module; a positive AC/DC (alternating current/direct current) power module; a negative AC/DC power module; a power pulse output module; and a computer control and data acquisition module, wherein the power pulse output module further comprises a pulse controller and an insulated-gate bipolar transistor (IGBT) power switch, and wherein the PDRL module is operatively coupled to both the positive and negative AC/DC power modules and the respective positive and negative power modules are then operatively coupled to both the power pulse output module and the computer control and data acquisition module, and wherein the computer control and data acquisition module controls both the respective positive and negative power modules and the power pulse output module to generate pulsed DC for controlled interruption of the arcing process.