The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2015
Filed:
Sep. 23, 2011
Applicants:
Jee-yun Song, Uiwang-si, KR;
Min-soo Kim, Uiwang-si, KR;
Hwan-sung Cheon, Uiwang-si, KR;
Seung-bae OH, Uiwang-si, KR;
Yoo-jeong Choi, Uiwang-si, KR;
Inventors:
Jee-Yun Song, Uiwang-si, KR;
Min-Soo Kim, Uiwang-si, KR;
Hwan-Sung Cheon, Uiwang-si, KR;
Seung-Bae Oh, Uiwang-si, KR;
Yoo-Jeong Choi, Uiwang-si, KR;
Assignee:
Cheil Industries, Inc., Gumi-si, Kyeongsangbuk-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 23/498 (2006.01); H01L 21/308 (2006.01); C09D 7/12 (2006.01); H01L 21/311 (2006.01); H01L 21/02 (2006.01); H01L 21/027 (2006.01); G03F 7/09 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31144 (2013.01); H01L 21/02118 (2013.01); H01L 21/02282 (2013.01); H01L 21/0271 (2013.01); G03F 7/094 (2013.01);
Abstract
A hard mask composition includes a solvent and an aromatic ring-containing compound represented by the following Chemical Formula 1: