The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2015
Filed:
Oct. 08, 2013
Applicants:
The University of Massachusetts, Boston, MA (US);
The Regents of the University of California, Oakland, CA (US);
Inventors:
Assignee:
Other;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 43/02 (2006.01); H01L 21/311 (2006.01); B81C 1/00 (2006.01); B82Y 30/00 (2011.01); G11C 11/14 (2006.01); H01L 29/06 (2006.01); H01L 43/12 (2006.01);
U.S. Cl.
CPC ...
H01L 21/31133 (2013.01); Y10T 428/2457 (2015.01); Y10T 428/24802 (2015.01); B81C 1/00031 (2013.01); B81C 2201/0149 (2013.01); B82Y 30/00 (2013.01); G11C 11/14 (2013.01); Y10S 977/888 (2013.01); Y10S 977/70 (2013.01); H01L 29/0657 (2013.01); H01L 43/02 (2013.01); H01L 43/12 (2013.01); Y10S 977/757 (2013.01);
Abstract
A nanopatterned surface is prepared by forming a block copolymer film on a miscut crystalline substrate, annealing the block copolymer film, then reconstructing the surface of the annealed block copolymer film The method creates a well-ordered array of voids in the block copolymer film that is maintained over a large area. The nanopatterned block copolymer films can be used in a variety of different applications, including the fabrication of high density data storage media.