The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2015
Filed:
Oct. 24, 2008
Applicants:
Peter Brick, Regensburg, DE;
Uwe Strauss, Bad Abbach, DE;
Inventors:
Peter Brick, Regensburg, DE;
Uwe Strauss, Bad Abbach, DE;
Assignee:
CSRAM Opto Semiconductors GmbH, Regensburg, DE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/49 (2006.01); H01S 5/32 (2006.01); H01S 5/00 (2006.01); H01S 5/10 (2006.01); H01S 5/20 (2006.01); H01S 5/30 (2006.01); H01S 5/40 (2006.01);
U.S. Cl.
CPC ...
H01S 5/32 (2013.01); H01S 5/0035 (2013.01); H01S 5/10 (2013.01); H01S 5/1017 (2013.01); H01S 5/204 (2013.01); H01S 5/3095 (2013.01); H01S 5/3215 (2013.01); H01S 5/4043 (2013.01); H01S 2301/18 (2013.01); H01S 2301/185 (2013.01); H01S 2301/206 (2013.01);
Abstract
A method for manufacturing a radiation-emitting component () in which a field distribution of a near field () in a direction perpendicular to a main emission axis of the component is specified. From the field distribution of the near field, an index of refraction profile () along this direction is determined. A structure is determined for the component such that the component will have the previously determined index of refraction profile. The component is constructed according to the previously determined structure. A radiation-emitting component is also disclosed.