The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2015

Filed:

Dec. 19, 2012
Applicant:

Universiteit Antwerpen, Antwerp, BE;

Inventors:

Johan Verbeeck, Hever, BE;

Gustaaf Van Tendeloo, Kessel, BE;

Assignee:

Universiteit Antwerpen, Antwerp, BE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/04 (2006.01); H01J 37/26 (2006.01); H01J 3/02 (2006.01); H01J 37/06 (2006.01); H01J 37/08 (2006.01); H01J 37/256 (2006.01);
U.S. Cl.
CPC ...
H01J 37/04 (2013.01); H01J 2237/2614 (2013.01); H01J 3/02 (2013.01); H01J 3/021 (2013.01); H01J 37/06 (2013.01); H01J 37/08 (2013.01); H01J 37/256 (2013.01); H01J 2237/06383 (2013.01); H01J 37/261 (2013.01);
Abstract

A device for imparting an orbital angular momentum to a charged particle wave propagating along a beam axis in a charged particle beam generating apparatus is described. The device comprises a support element having a target region adapted for transmitting a charged particle wave propagating along a beam axis and an induction means for inducing a magnetic flux along an elongated profile having a free end portion located in the target region and the induction means is adapted for providing a magnetic flux in the elongated profile in order to induce an angular gradient, relative to the beam axis, of the phase of the charged particle wave when transmitted through the target region. A corresponding method is also disclosed, as well as the use thereof in electron microscopy.


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