The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2015
Filed:
Mar. 16, 2012
Applicant:
Walt A. DE Heer, Atlanta, GA (US);
Inventor:
Walt A. De Heer, Atlanta, GA (US);
Assignee:
Georgia Tech Research Corporation, Atlanta, GA (US);
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/06 (2006.01); H01L 21/768 (2006.01); H01L 29/16 (2006.01); H01L 23/522 (2006.01); H01L 23/532 (2006.01);
U.S. Cl.
CPC ...
H01L 21/76885 (2013.01); H01L 29/1606 (2013.01); H01L 21/76879 (2013.01); H01L 23/5226 (2013.01); H01L 23/53276 (2013.01); Y10S 438/931 (2013.01);
Abstract
In a method for making graphitic ribbons in a face of a carbide crystal (), in which an elongated trench () is formed along a predetermined path in the face () of the carbide crystal (), the trench () including a horizontal floor () coupling two vertical walls (), the trench () following a path on which it is desired to form a graphitic ribbon (). The carbide crystal () and the trench () are subjected to an annealing environment for an amount of time sufficient to cause a graphene ribbon () having a V-shaped cross section to form along the predetermined path of the trench ().