The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2015
Filed:
Nov. 10, 2010
Yanfeng Chen, Milpitas, CA (US);
Yunjun Tang, Pleasanton, CA (US);
Yana Qian, Sunnyvale, CA (US);
Ming M. Yang, San Jose, CA (US);
Yunfei LI, Fremont, CA (US);
Paul E. Anderson, Fremont, CA (US);
Yanfeng Chen, Milpitas, CA (US);
Yunjun Tang, Pleasanton, CA (US);
Yana Qian, Sunnyvale, CA (US);
Ming M. Yang, San Jose, CA (US);
Yunfei Li, Fremont, CA (US);
Paul E. Anderson, Fremont, CA (US);
Western Digital (Fremont), LLC, Fremont, CA (US);
Abstract
Damascene processes using physical vapor deposition (PVD) sputter carbon film as a chemical mechanical planarization (CMP) stop layer for forming a magnetic recording head are provided. In one embodiment, one such process includes providing an insulator, removing a portion of the insulator to form a trench within the insulator, depositing a carbon material on first portions of the insulator using a physical vapor deposition process, disposing at least one ferromagnetic material on second portions of the insulator to form a pole including a portion of the ferromagnetic material within the trench, and performing a chemical mechanical planarization on the at least one ferromagnetic material using at least a portion of the carbon material as a stop for the chemical mechanical planarization.