The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2015
Filed:
Mar. 12, 2008
Kazuyuki Ogawa, Osaka, JP;
Atsushi Kazuno, Osaka, JP;
Tsuyoshi Kimura, Osaka, JP;
Tetsuo Shimomura, Osaka, JP;
Kazuyuki Ogawa, Osaka, JP;
Atsushi Kazuno, Osaka, JP;
Tsuyoshi Kimura, Osaka, JP;
Tetsuo Shimomura, Osaka, JP;
Toyo Tire & Rubber Co., Ltd., Osaka-shi, JP;
Abstract
An object of the present invention is to provide a polishing pad that is prevented from causing an end-point detection error due to a reduction in light transmittance from the early stage to the final stage of the process, and to provide a method of producing a semiconductor device with the polishing pad. The present invention is directed to a polishing pad, comprising a polishing layer comprising a polishing region and a light-transmitting region, wherein a polishing side surface of the light-transmitting region is subjected to a surface roughness treatment, and the light-transmitting region has a light transmittance of 40% to 60% at a wavelength of 600 nm before use.