The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2015
Filed:
Apr. 17, 2012
Joong-hyuk Kim, Seoul, KR;
Sung-gyu Kang, Gyeonggi-do, KR;
Seung-ho Lee, Gyeonggi-do, KR;
Jae-woo Chung, Gyeonggi-do, KR;
Young-ki Hong, Gyeonggi-do, KR;
Joong-hyuk Kim, Seoul, KR;
Sung-gyu Kang, Gyeonggi-do, KR;
Seung-ho Lee, Gyeonggi-do, KR;
Jae-woo Chung, Gyeonggi-do, KR;
Young-ki Hong, Gyeonggi-do, KR;
Samsung Electronics Co., Ltd., Gyeonggi-Do, KR;
Abstract
A method of forming patterns on a substrate, the method including: placing a mask having an opening defining a portion of one surface of a substrate on which patterns are to be formed on the substrate; forming a first modification layer in the opening by ejecting a surface modification ink onto a surface of the substrate through the opening; ejecting a target ink having droplets of sizes larger than those of a surface modification ink such that the target ink is distributed on the first modification layer in the opening; and removing the mask.