The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2015

Filed:

Feb. 25, 2013
Applicant:

Eastman Kodak Company, Rochester, NY (US);

Inventors:

Debasis Majumdar, Manchester, NH (US);

Lawrence A. Rowley, Rochester, NY (US);

Jayme Diniz Ribeiro, Pittsford, NY (US);

David Andrew Johnson, Rochester, NY (US);

Todd Mathew Spath, Hilton, NY (US);

Assignee:

Eastman Kodak Company, Rochester, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/26 (2006.01); G03F 7/16 (2006.01);
U.S. Cl.
CPC ...
G03F 7/16 (2013.01);
Abstract

A method of patterning a conductive polymer includes providing a conductive polymer layer coated over a first support followed by pattern-wise transferring a layer containing polyvinyl acetal from a second support onto the conductive polymer to form a mask with at least one opening. The masked conductive polymer is subjected to treatment through the opening that changes the conductivity of the conductive polymer by at least one order of magnitude in areas not covered by the mask.


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