The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2015
Filed:
Sep. 02, 2011
Jeong Won Kim, Suwon-si, KR;
Jin Ho Ju, Seoul, KR;
Jong Kwang Lee, Daejeon, KR;
Min Kang, Seoul, KR;
Tae Gyun Kim, Yongin-si, KR;
Jeong Won Kim, Suwon-si, KR;
Jin Ho Ju, Seoul, KR;
Jong Kwang Lee, Daejeon, KR;
Min Kang, Seoul, KR;
Tae Gyun Kim, Yongin-si, KR;
Samsung Display Co., Ltd., , KR;
Abstract
A method for forming a pattern includes forming a photosensitive film by coating a photosensitive resin composition on a substrate, exposing the photosensitive film to light through a mask that includes a light transmission region and a non-light transmission region, coating a developing solution on the photosensitive film, and forming a photosensitive film pattern by baking the photosensitive film, wherein the photosensitive resin composition includes an alkali soluble base resin, a photoacid generator and a photoactive compound.