The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 28, 2015
Filed:
Jul. 25, 2013
Applicants:
Jin Choi, Yongin-si, KR;
Heung-suk OH, Bucheon-si, KR;
Sin-jeung Park, Seoul, KR;
Rae-won Yi, Suwon-si, KR;
Inventors:
Jin Choi, Yongin-si, KR;
Heung-Suk Oh, Bucheon-si, KR;
Sin-jeung Park, Seoul, KR;
Rae-won Yi, Suwon-si, KR;
Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/00 (2006.01); H01L 21/308 (2006.01); G06F 17/50 (2006.01); G03F 1/00 (2012.01); H01L 21/027 (2006.01);
U.S. Cl.
CPC ...
H01L 21/308 (2013.01); G06F 17/5081 (2013.01); G03F 1/00 (2013.01); H01L 21/027 (2013.01);
Abstract
A method of providing a photolithography pattern can be provided by identifying at least one weak feature from among a plurality of features included in a photolithography pattern based on a feature parameter that is compared to a predetermined identification threshold value for the feature parameter. A first region of the weak feature can be classified as a first dosage region and a second region of the weak feature can be classified as a second dosage region. Related methods and apparatus are also disclosed.