The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2015

Filed:

May. 25, 2012
Applicants:

Justin C Lytle, Tacoma, WA (US);

Trevor N. Zimmerman, Pendleton, SC (US);

Debra R Rolison, Arlington, VA (US);

Inventors:

Justin C Lytle, Tacoma, WA (US);

Trevor N. Zimmerman, Pendleton, SC (US);

Debra R Rolison, Arlington, VA (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
B32B 1/08 (2006.01); D03D 15/00 (2006.01); B82Y 30/00 (2011.01); C01B 31/02 (2006.01); C04B 35/628 (2006.01); C23C 16/01 (2006.01); C23C 16/26 (2006.01); H01M 4/587 (2010.01); B05D 5/12 (2006.01); C01B 31/00 (2006.01); D04H 13/00 (2006.01); B32B 1/02 (2006.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
D03D 15/00 (2013.01); Y10T 428/13 (2015.01); Y10T 428/2918 (2015.01); B82Y 30/00 (2013.01); C01B 31/02 (2013.01); C04B 35/62873 (2013.01); C04B 35/62897 (2013.01); C04B 2235/5232 (2013.01); C04B 2235/5288 (2013.01); C04B 2235/6028 (2013.01); C23C 16/01 (2013.01); C23C 16/26 (2013.01); H01M 4/587 (2013.01); B05D 5/12 (2013.01); B32B 1/08 (2013.01); B82Y 40/00 (2013.01); C01B 31/00 (2013.01); D04H 13/00 (2013.01); Y10S 427/101 (2013.01);
Abstract

A carbon nanopipe comprising a durable graphitizable carbon wall of tunable thickness of about 10-500 nm formed by exposing a silica fiber network to a carbon precursor vapor and thereby depositing a carbon film onto the silica fiber network at a temperature suitable for complete pyrolysis of the carbon precursor and removing the silica fibers. The atmosphere of the step of depositing is controlled by a two-stage gas manifold wherein stage 1 purges the reaction chamber with pure argon and stage 2 introduces the carbon precursor.


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