The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2015

Filed:

Mar. 16, 2012
Applicants:

Nicholas P. Wynn, Redwood City, CA (US);

Haiqing Lin, Mountain View, CA (US);

Meijuan Zhou, Fremont, CA (US);

Jennifer H. Ly, San Jose, CA (US);

Livia Serbanescu-martin, San Jose, CA (US);

Inventors:

Nicholas P. Wynn, Redwood City, CA (US);

Haiqing Lin, Mountain View, CA (US);

Meijuan Zhou, Fremont, CA (US);

Jennifer H. Ly, San Jose, CA (US);

Adrian Serbanescu-Martin, San Jose, CA (US);

Assignee:
Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B01D 53/22 (2006.01); B01D 53/047 (2006.01); B01D 53/14 (2006.01);
U.S. Cl.
CPC ...
B01D 53/229 (2013.01); B01D 53/047 (2013.01); B01D 53/14 (2013.01); B01D 53/226 (2013.01); B01D 2256/245 (2013.01);
Abstract

A gas separation process that utilizes ejector recycle with a membrane separation step in combination with a second separation step. The second separation step may be a second membrane separation, or may involve a different type of separation process. At least a portion of the non-product (i.e. residue) stream withdrawn from the second separation step is directed back to the ejector to form a processing loop. The ejector drives the gas flow in the loop and recycles the non-product stream to the first separation step.


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