The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2015

Filed:

Nov. 29, 2011
Applicants:

Caihua Chen, Albany, NY (US);

Edward Barkan, Miller Place, NY (US);

Mark Drzymala, St. James, NY (US);

Inventors:

Caihua Chen, Albany, NY (US);

Edward Barkan, Miller Place, NY (US);

Mark Drzymala, St. James, NY (US);

Assignee:

Symbol Technologies, Inc., Holtsville, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06K 7/10 (2006.01); G06K 7/14 (2006.01); G03B 7/08 (2006.01); G06K 15/12 (2006.01); G06K 9/20 (2006.01);
U.S. Cl.
CPC ...
G06K 7/10732 (2013.01); G06K 7/10722 (2013.01); G06K 9/2027 (2013.01); G06K 7/10742 (2013.01); G06K 7/1096 (2013.01);
Abstract

Indicia are imaged at a workstation having windows arranged in intersecting planes. The workstation also has solid-state imagers with fields of view that are split into intersecting subfields that look out through the windows, as well as illumination assemblies each having multiple light sources that illuminate each subfield with illumination light over an illumination field that overlaps a respective subfield. Light-modifying elements, such as lenses or baffles that are radially offset from the multiple light sources, condition the illumination light from the multiple light sources to be generally uniform in light intensity over at least one illuminated subfield.


Find Patent Forward Citations

Loading…