The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 28, 2015

Filed:

Dec. 20, 2012
Applicant:

Caterpillar Inc., Peoria, IL (US);

Inventor:

Dennis D. Wetterich, Newark, IL (US);

Assignee:

Caterpillar Inc., Peoria, IL (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B62D 49/06 (2006.01); E02F 9/08 (2006.01);
U.S. Cl.
CPC ...
E02F 9/0833 (2013.01); E02F 9/0841 (2013.01);
Abstract

A platform system for an articulated machine is disclosed. The platform system can include a first platform which can be pivotally supported by a front frame of an articulated machine. The front frame of the articulated machine can be pivotally coupled to a rear frame of the articulated machine at an articulation joint. A second platform can be pivotally supported by the rear frame of the articulated machine. The second platform can include a first edge which can be positioned adjacent to a first edge of the first platform. Each of the first edge of the first platform and the first edge of the second frame platform can have a radial profile which can be aligned with a path of pivotal movement between the first platform and the second frame platform.


Find Patent Forward Citations

Wetterich, Dennis. (2015). Platform system for an articulated machine (U.S. Patent No. 9016423). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9016423

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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