The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Apr. 21, 2015
Filed:
Oct. 18, 2013
Shenzhen China Star Optelectronics Technology Co., Ltd., Shenzhen, Guangdong, CN;
Xiangyang Xu, Guangdong, CN;
Weimin Chang, Guangdong, CN;
Zhiyang Song, Guangdong, CN;
Liang Wang, Guangdong, CN;
Shenzhen China Star Optoelectronics Technology Co., Ltd., Shenzhen, Guangdong, CN;
Abstract
The present invention provides an antistatic structure of an array substrate, which includes: an effective zone () of an array substrate and a plurality of dummy wires () surrounding the effective zone (). The effective zone () includes a plurality of signal wires () and a plurality of shorting bars () respectively in electrical connection with the plurality of signal wires (). The dummy wires () are set to be respectively corresponding to and adjacent to outermost ones of the shorting bars () of the effective zone (). The dummy wires () each include an inner side () that is close to the shorting bars () and forms a saw-toothed arrangement. The present invention arranges a dummy wire adjacent to each of the outermost ones of shorting bars and the dummy wire has one side that is close to the shorting bar and forms a saw-toothed arrangement. As such, during a manufacturing process of the array substrate, particularly in dry etching operations of an insulation protection layer and an active layer, metal intersections of the shorting bar can be well protected from static electricity damage caused by abnormal discharge resulting from plasma so as to improve product quality.