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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 9013001 B1

PDFFull Text
Date of Patent:
Apr. 21, 2015

Filed:

Jul. 22, 2013

Stress-generating shallow trench isolation structure having dual composition

Applicant:

International Business Machines Corporation, Armonk, NY (US);

Inventors:

Huilong Zhu, Poughkeepsie, NY (US);

Jing Wang, Beacon, NY (US);

Assignee:

International Business Machines Corporation, Armonk, NY (US);

Attorneys:

Scully, Scott, Murphy & Presser, P.C.

Yuanmin Cai

Primary Examiner:

Cathy N Lam

Int. Cl.
CPC ...
H01L 21/62 (2006.01); H01L 23/58 (2006.01); H01L 27/088 (2006.01); H01L 29/78 (2006.01); H01L 21/308 (2006.01); H01L 21/3105 (2006.01); H01L 21/762 (2006.01); H01L 21/8238 (2006.01); H01L 27/092 (2006.01);
U.S. Cl.
CPC ...
H01L 29/7846 (2013.01); H01L 21/3081 (2013.01); H01L 21/31053 (2013.01); H01L 21/76224 (2013.01); H01L 21/823807 (2013.01); H01L 21/823878 (2013.01); H01L 27/092 (2013.01); H01L 2924/0002 (2013.01);
Abstract

A shallow trench isolation structure containing a first shallow trench isolation portion comprising the first shallow trench material and a second shallow trench isolation portion comprising the second shallow trench material is provided. A first biaxial stress on at least one first active area and a second bidirectional stress on at least one second active area are manipulated separately to enhance charge carrier mobility in middle portions of the at least one first and second active areas by selection of the first and second shallow trench materials as well as adjusting the type of the shallow trench isolation material that each portion of the at least one first active area and the at least one second active area laterally abut.

Find Patent Forward Citations

Zhu, Huilong. (2015). Stress-generating shallow trench isolation structure having dual composition (U.S. Patent No. 9013001). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/9013001

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

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