The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Apr. 21, 2015

Filed:

Dec. 28, 2012
Applicant:

Sharp Kabushiki Kaisha, Osaka-shi, Osaka, JP;

Inventor:

Akihiro Oda, Osaka, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/10 (2006.01); H01L 27/12 (2006.01); H01L 21/02 (2006.01); H01L 29/417 (2006.01);
U.S. Cl.
CPC ...
H01L 27/1225 (2013.01); H01L 27/1259 (2013.01); H01L 21/02565 (2013.01); H01L 29/41733 (2013.01);
Abstract

This semiconductor device () includes a substrate (), a gate electrode (), a gate insulating film (), an oxide semiconductor layer (), a source electrode (), a drain electrode (), and a protective film (). The upper and side surfaces of the oxide semiconductor layer are covered with the source and drain electrodes and the protective film. When viewed along a normal to the substrate, the narrowest gap between the respective outer peripheries of a first contact region () and the source electrode and the narrowest gap between the respective outer peripheries of a second contact region () and the drain electrode both have a length of 1.5 μm to 4.5 μm.


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